Abstract
Systems and methods for designing, optimizing, patterning, forming, and manufacturing symphotic structures are described herein. A symphotic structure may be formed by identifying a continuous refractive index distribution calculated to convert each of a plurality of input reference waves to a corresponding plurality of output object waves. The continuous refractive index distribution can be modeled as a plurality of subwavelength voxels. The system can calculate a symphotic pattern as a three-dimensional array of discrete dipole values to functionally approximate the subwavelength voxels. A symphotic structure may be formed with a volumetric distribution of dipole structures. A dipole value, such as a dipole moment (direction and magnitude) of each dipole is selected for the volumetric distribution to convert a plurality of input reference waves to a target plurality of output object waves.
Original language | English |
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Patent number | US16/138,961 |
Publication status | Published - 2019 |