The deposition and characterisation of CVD tungsten silicide for applications in microelectronics

Mervyn Armstrong, Michael Bain, Harold Gamble

Research output: Contribution to journal › Article › peer-review

ASJC Scopus subject areas

@article{ad40c71ab58d4448bae29969b0856f47,

title = "The deposition and characterisation of CVD tungsten silicide for applications in microelectronics",

author = "Mervyn Armstrong and Michael Bain and Harold Gamble",

year = "2002",

month = jan,

language = "English",

volume = "64(3-4)",

pages = "227--232",

journal = "Vacuum",

issn = "0042-207X",

publisher = "Elsevier Ltd",

number = "3-4",

}

TY - JOUR

T1 - The deposition and characterisation of CVD tungsten silicide for applications in microelectronics

AU - Armstrong, Mervyn

AU - Bain, Michael

AU - Gamble, Harold

PY - 2002/1

Y1 - 2002/1

UR - http://www.scopus.com/inward/record.url?scp=0036136188&partnerID=8YFLogxK

M3 - Article

SN - 0042-207X

VL - 64(3-4)

SP - 227

EP - 232

JO - Vacuum

JF - Vacuum

IS - 3-4

ER -