Tunable plasmonic SERS hotspots on Au-Film over nanosphere by rapid thermal annealing

Agnes Purwidyantri, Imene El-Mekki, Chao Sung Lai

Research output: Contribution to journalArticlepeer-review

21 Citations (Scopus)
23 Downloads (Pure)

Abstract

In this work, a novel method combining fabrication of non lithographic Au-film over nanosphere (AuFON) with gradual rapid thermal annealing (RTA) treatment was developed to produce a high performance of surface-enhanced Raman scattering (SERS) substrate. The highly uniform and periodic AuFON was achieved by the downscaling processs in the modified nanosphere lithography technique using 100-nm polystyrene (PS) nanospheres, which target significant SERS enhancement factor (EFSERS) due to effectively generated "hotspots." Two essential approaches in the nanostructure downscaling included the application of oxygen plasma or solvent ratio adjustment during PS nanospheres self assembly drop-casting procedures. After the production of Au- FON substrates, short RTA process on the AuFON was conducted at 250 °C, 500 °C, and 750 °C, respectively, to increase surface roughness that contribute to the improved SERS activity. Results show that the higher temperature of RTA linearly resulted in structural alteration of Au-film confined on PS spherical lining, which led to an eventual enhancement of SERS response on the detection of 1 μM Rhodamine 6G Raman probe. The most effective SERS reinforcement was demonstrated by (EFSERS) value of 1.08×108 by 750 °C of RTA. Overall, a downscaled nonlithographic SERS substrate with tunable plasmonic response by RTA process was successfully fabricated.

Original languageEnglish
Pages (from-to)551-559
Number of pages9
JournalIEEE Transactions on Nanotechnology
Volume16
Issue number4
Early online date02 Jan 2017
DOIs
Publication statusPublished - 01 Jul 2017
Externally publishedYes

Bibliographical note

Funding Information:
Manuscript received November 8, 2016; accepted December 22, 2016. Date of publication January 2, 2017; date of current version July 7, 2017. This work was supported in part by the Ministry of Science and Technology (MOST) of the Republic of China, under the contract no. MOST 105-2632-E-182-001 and MOST 105-2221-E-182-066 and in part by Chang Gung Memorial Hospital under Project nos. CMRPD2F0021 and CMRPD3D0112. The review of this paper was arranged by Associate Editor NANO2016.

Publisher Copyright:
© 2002-2012 IEEE.

Keywords

  • AuFON
  • downscaling
  • non-lithographic
  • PS nanospheres
  • SERS hotspots
  • short RTA

ASJC Scopus subject areas

  • Computer Science Applications
  • Electrical and Electronic Engineering

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