Tungsten Silicide Contacts to Polycrystalline Silicon and Silicon-Germanium Alloys

Gopalan Srinivasan, Michael Bain, Sekhar Bhattacharya, Paul Baine, Mervyn Armstrong, Harold Gamble, David McNeill

Research output: Contribution to journalArticle

7 Citations (Scopus)

Abstract

Novel CVD WSi2 technology with low series and contact resistance in SiGe HBTs was achieved. Specific contact resistance to Si1-xGex with 0
Original languageEnglish
Pages (from-to)223-227
Number of pages5
JournalMaterials Science and Engineering B
Volume114-115
Issue numberSPEC. ISS.
DOIs
Publication statusPublished - Dec 2004

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Materials Science(all)
  • Condensed Matter Physics

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