Fabrication of devices based on thin film structures deposited using the pulsed laser deposition technique relies on reproducibility and control of deposition rates over substrate areas as large as possible. Here we present an application of the random phase plate technique to smooth and homogenize the intensity distribution of a KrF laser footprint on the surface of a target which is to be ablated. It is demonstrated that intensity distributions over millimeter-sized spots on the target can be made insensitive to the typical changes that occur in the near-field intensity distribution of the ultraviolet output from a KrF laser. (C) 1999 American Institute of Physics. [S0034-6748(99)02504-6].
|Number of pages||6|
|Journal||Review of Scientific Instruments|
|Publication status||Published - Apr 1999|
ASJC Scopus subject areas
- Physics and Astronomy (miscellaneous)
Lewis, C., Weaver, I., Doyle, L. A., Martin, G. W., Morrow, T., Pepler, D. A., Danson, C. N., & Ross, I. N. (1999). Use of a random phase plate as a KrF laser beam homogenizer for thin film deposition applications. Review of Scientific Instruments, 70(4), 2116-2121.