Virtual metrology for plasma etch using tool variables

S. Lynn, J. Ringwood, N. MacGearailt, E. Ragnoli, Seán McLoone

Research output: Contribution to conferencePaperpeer-review

32 Citations (Scopus)
Original languageEnglish
Publication statusPublished - 2009
EventIEEE/SEMI Advanced Semiconductor Manufacturing Conference (ASMC) - Berlin, Germany
Duration: 01 May 200901 May 2009

Conference

ConferenceIEEE/SEMI Advanced Semiconductor Manufacturing Conference (ASMC)
CountryGermany
CityBerlin
Period01/05/200901/05/2009

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