Virtual metrology for plasma etch using tool variables

S. Lynn, J. Ringwood, N. MacGearailt, E. Ragnoli, Seán McLoone

Research output: Contribution to conference › Paper › peer-review

Original language	English
Publication status	Published - 2009
Event	IEEE/SEMI Advanced Semiconductor Manufacturing Conference (ASMC) - Berlin, Germany Duration: 01 May 2009 → 01 May 2009

Conference	IEEE/SEMI Advanced Semiconductor Manufacturing Conference (ASMC)
Country/Territory	Germany
City	Berlin
Period	01/05/2009 → 01/05/2009

Cite this

@conference{ae604c7d4a4742dda1d626d6bfdbf75b,

title = "Virtual metrology for plasma etch using tool variables",

author = "S. Lynn and J. Ringwood and N. MacGearailt and E. Ragnoli and Se{\'a}n McLoone",

year = "2009",

language = "English",

note = "IEEE/SEMI Advanced Semiconductor Manufacturing Conference (ASMC) ; Conference date: 01-05-2009 Through 01-05-2009",

}