Characterisation of copper CVD films deposited using a Cu(I)(hfac)TMVS precursor

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    Original languageEnglish
    Pages253-256
    Number of pages4
    Publication statusPublished - Dec 2000
    EventProceedings of International Conference on Communications, Computers & Devices, ICCCD-2000 - Kharagpur, India
    Duration: 01 Dec 200001 Dec 2000

    Conference

    ConferenceProceedings of International Conference on Communications, Computers & Devices, ICCCD-2000
    CountryIndia
    CityKharagpur
    Period01/12/200001/12/2000

    ID: 726424